Polyurethane polishing pad
Even polishing
Resistant to wear and tear, with a long service life
Product Features
High removal rate
Significantly enhance the speed and output of polishing processes.
Wear-resistant
Polyurethane material has good wear resistance and can maintain stable performance even after prolonged use.
High processing efficiency
Short processing time and high production efficiency.
Wide applicability
It can be used in multiple scenarios to meet different process requirements.
Product Parameters
Relevant cases
Quality Assurance
Each finished polishing pad undergoes comprehensive inspection in multiple dimensions, including thickness, hardness, and porosity, to ensure uniform and stable microstructure, providing customers with consistent polishing performance.
Among polishing pads of the same type, this product exhibits significant advantages in terms of removal rate stability and defect control (scratching, pitting), effectively meeting the semiconductor production line's ultimate pursuit of high yield and process window.
We achieve this through our unparalleled customer service,
Establish trustworthy partnerships on a global scale.
