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Polyurethane polishing pad

Even polishing Resistant to wear and tear, with a long service life

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Non-woven polishing pad

Strong flatness and good cushioning Compatible with multiple processes

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Damping cloth polishing pad

It has a cushioning effect, reducing surface damage The polishing pressure is evenly distributed Good stability, enhancing processing consistency

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Silicon dioxide polishing slurry

Highly selective polishing, with excellent planarization effect Ultra-low defect rate, high surface cleanliness The colloid has good stability and a wide process window

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Alumina polishing slurry

High cutting rate, excellent polishing efficiency Uniform particle size and excellent surface quality It is chemically stable and has a wide range of applications

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